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High-K And ALD/CVD Metal Precursor Market Size in North America Region is Anticipated to Experience High Surge by 2024

Author : Ronak Bora | Published Date : 2019-05-30 

North America high-k and ALD/CVD metal precursor market size revenue is expected to witness a high surge over the period of 2016-2024, driven by growing nanotechnology and microelectronics sector. U.S. is projected to contribute significantly towards the regional revenue.

Favorable government legislations encouraging production of power saving semiconductor devices will benefit high-k and ALD/CVD metal precursor market. High application potential of semiconductors in mobiles, smartphones, iPhones, cars, and DTV are expected to enhance the growth prospects of the industry over the coming years.

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As per Global Market Insights, Inc., research study “high-k and ALD/CVD metal precursor market size is forecast to hit USD 965 million by 2024.” Today, industry players are laying more emphasis on developing processes to form hybrid thin inorganic-organic films with the desired features to reduce production costs, thereby stimulating the demand for high-k and ALD/CVD metal precursors. High popularity of trailing edge devices supporting internet of things (IoT) technology and consumer electronics sector growth, is expected to fuel the industry trends over the coming seven years.

Several manufacturers are now shifting their focus towards chemical, dielectric and optical properties of hybrid inorganic-organic films in order to minimize manufacturing costs. Increasing intellectual property rights (IPR) protection laws will play a key role in IPR filings on chemical designs and precursor material composition. Strategic alliances along the high-k and ALD/CVD metal precursor market value chain are required to effectively provide chemicals for the equipment in terms of new molecules and hardware.

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Gates are forecast to grow at over 20% CAGR, and possess significant potential to replace silicon oxide in the 65nm CMOS space. Properties such as compatibility with gate electrode material, chemical and thermal stability, high dielectric constant and interface state density make it a preferable choice thus driving the demand for this segment.

Interconnects accounted for more than 45% of high-k and ALD/CVD metal precursor market revenue in 2015 and led the industry during the same year. New memory technologies and non-planar transistors will provide new avenues for thin film raw material suppliers in order to expedite the fabrication process.

High-k and ALD/CVD metal precursor market participants will try to improve their ROI by adopting key growth strategies such as high R & D investments, competitive pricing, product differentiation, and strategic collaborations. Key industry players include The DOW Chemical Company, Air Liquide, Adeka Corporation, ATMI Incorporated, Air Products & Chemicals Incorporation, and UP Chemical Company Limited.

About Global Market Insights:

Global Market Insights, Inc., headquartered in Delaware, U.S., is a global market research and consulting service provider; offering syndicated and custom research reports along with growth consulting services. Our business intelligence and industry research reports offer clients with penetrative insights and actionable market data specially designed and presented to aid strategic decision making. These exhaustive reports are designed via a proprietary research methodology and are available for key industries such as chemicals, advanced materials, technology, renewable energy and biotechnology.

About Author

Ronak Bora

Ronak Bora

A graduate in Electronics Engineering, Ronak writes for Fractovia.org and carries a rich experience in digital marketing, exploring how the online world works from a technical and marketing perspective. His other areas of interest include reading, music, and sport. He can be contacted at- [email protected] | https://twitter.com/RonakBora26

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