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High-K And ALD/CVD Metal Precursor Market in Asia Pacific is Projected to Grow At A Fasted Rate by 2024

Author : Ronak Bora | Published Date : 2019-05-15 

In terms of regional landscape of High-k and ALD/CVD metal precursor market, Asia Pacific is one of the dominating players in the global scenario. China being the major revenue pocket for APAC market, held a 35% of the total revenue share in 2015. Driven by the growing end-use electronics product demand of the region, China High-k and ALD/CVD metal precursor industry is anticipated to continue its dominance in the regional market. As per the estimates, Taiwan holds the largest consumer base of advanced semiconductor materials, which in turn is projected to have a parallel impact on the region’s high-k and ALD/CVD metal precursor market. In this regard, another significant move in the industry was the collaboration of Chemtura Corporation with UP chemical to strengthen their LED market concentrating around Asia Pacific, by producing high purity MO precursors.

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Several manufacturers are now shifting their focus towards chemical, dielectric and optical properties of hybrid inorganic-organic films in order to minimize manufacturing costs. Increasing intellectual property rights (IPR) protection laws will play a key role in IPR filings on chemical designs and precursor material composition. Strategic alliances along the high-k and ALD/CVD metal precursor market value chain are required to effectively provide chemicals for the equipment in terms of new molecules and hardware.

Cost-effective and seamless fabrication of semiconductor devices for complicated 3D architectures have widened the scope for extensive R&D to develop high-quality sophisticated precursors in cylinders. Government initiatives and regulations regarding semiconductor device manufacturing will provide a boost to the high-k and ALD/CVD metal precursor market share over the forecast timeframe.

Nanotechnologies and improving innovative methodologies coupled with rising surface topography complexity have led to developments such as maintaining uniformity on thin film surface. Increasing LED applications will positively impact growth. Delayed or slow formation of thin films may hinder the industry share during the projected timeline.

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Based on metal precursor technology, the market is segmented into gates, interconnect, and capacitors. Interconnect high-k and ALD/CVD metal precursor market dominated the global demand in 2015 with an industry coverage of 45% of the total volume. With the evolution of power electronics incorporated with nonplanar transistors, nonvolatile memory chips, interconnect technology is in high demand. This segment dominated the technology landscape in 2015 accounting for 45% of the global demand. High-k gate precursor industry also had a considerable share of the global revenue in 2015 having collected a revenue of USD 33 million in 2015.

Owing to some of the attributing factors that these precursors provide such as high dielectric constant, chemical and thermal stability, compatibility with gate electrode, these metal precursors are replacing silicon oxide in CMOS (complementary metal oxide semiconductor). High-k and ALD/CVD metal precursor market based on gate technology are slated to witness a massive annual growth rate of 23% over the coming seven years.

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Mergers and acquisitions along with competitive pricing remain the major business strategies adopted by the key market players. Some of the prominent participants operating in. high-k and ALD/CVD metal precursor market include Dow Chemical, Air Liquide, UP Chemical, and Adeka.

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About Author

Ronak Bora

Ronak Bora

A graduate in Electronics Engineering, Ronak writes for Fractovia.org and carries a rich experience in digital marketing, exploring how the online world works from a technical and marketing perspective. His other areas of interest include reading, music, and sport. He can be contacted at- [email protected] | https://twitter.com/RonakBora26

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